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High Vacuum Gate Valve for Semiconductor Wafer Load Lock Systems

High Vacuum Gate Valve for Semiconductor Wafer Load Lock Systems

Engineered for ultra-high vacuum and semiconductor applications, this high-performance gate valve features a linear lift-gate design for rapid, low-particle, and vibration-free isolation. Available in customizable sizes and materials, it is the ideal solution for 200mm, 300mm, and 450mm wafer load lock systems.

 

Product Overview

This high-performance high vacuum gate valve is a precision-engineered vacuum isolation and transmission device specifically designed for ultra-high vacuum (UHV), semiconductor wafer production, and load lock chamber isolation. Utilizing a linear lift-type gate opening and closing structure, it is perfectly suited for the full pressure range from 5×10⁻⁸ Pa to 1×10⁵ Pa (ultra-high vacuum to atmospheric pressure).

It enables rapid isolation and sealed partition of atmospheric-side load lock chambers in 200mm, 300mm, and 450mm semiconductor wafer production systems. With its fast switching speed, low particle generation, vibration-free operation, and ease of maintenance, this valve is the core preferred equipment for semiconductor vacuum systems and high-cleanliness vacuum transmission scenarios.

Core Features

  • Linear Lift Gate Structure: Ensures smooth opening and closing, perfectly meeting the isolation requirements of wafer load lock chambers with rapid response times.
  • Unique Cylinder Design: Driven by a pneumatic double-acting actuator, providing stable and reliable operation. It supports seamless integration into automated production lines for continuous operation.
  • Premium Material Customization: The main body is crafted from aviation-grade aluminum (optional stainless steel available), offering high strength, corrosion resistance, and low outgassing for high-cleanliness semiconductor environments.
  • Reliable O-ring Sealing: Features a high-quality rubber ring sealing solution that ensures zero leakage and meets the stringent requirements of high vacuum systems.
  • Full Size Customization: We support the customization of any size according to customer needs, adapting to various wafer production systems and vacuum load lock chambers.
  • Expandable Temperature Control: Optional water-cooling and temperature control modules are available to effectively manage valve temperature and extend equipment service life.

Technical Specifications

Opening Diameter (DN) Main Material Actuator Type Example Model Number
DN500 × 100 Aluminum Alloy (Optional) Pneumatic Double-Acting VAvat-G1113-61-DN500X100
DN800 × 130 Stainless Steel (Optional) Pneumatic Double-Acting VAvat-G1113-62-DN800X130
Note: All specifications are customizable; water-cooling and temperature control modules can be integrated upon request.

Application Fields

The versatility of our high vacuum gate valve makes it indispensable in several high-tech industries:

  • Semiconductor Wafer Production: Essential for the isolation of atmospheric-side load lock chambers in 200, 300, and 450mm wafer systems.
  • Vacuum Load Lock Systems: Facilitates the environment switching between the semiconductor process chamber and the atmosphere.
  • High-Cleanliness Transmission: Ideal for high-clean vacuum transmission in semiconductor and photovoltaic industries where low particle counts are critical.
  • Automated Production Lines: Supports full automation integration for continuous wafer transmission and chamber isolation.
  • Custom Vacuum Solutions: Adaptable for non-standard sizes and special process requirements in high-end semiconductor equipment.

Why Choose Our High Vacuum Gate Valve?

Our gate valve is specifically engineered for scenarios requiring low particle generation and high response speeds. Compared to standard transmission valves, our design offers faster switching and significantly lower vibration, which is crucial for maintaining wafer integrity.

Fast Response & Long Life: Short opening/closing times with sensitive induction ensure a long service life under continuous production cycles. Low Maintenance: The unique cylinder design reduces wear and tear, making maintenance simple and cost-effective while ensuring high reliability in vacuum isolation tasks.

Frequently Asked Questions (FAQ)

1. What is the primary use of this valve?

It is primarily used for isolating the atmospheric-side load lock chambers in 200mm to 450mm semiconductor wafer production systems.

2. What are the available driving methods?

The valve utilizes a pneumatic double-acting drive with a unique cylinder design for smooth and stable operation.

3. Can the materials be customized for corrosive environments?

Yes, while aviation aluminum is standard, we offer stainless steel options to suit different corrosive conditions and cleanliness levels.

4. Does it support non-standard sizes?

Absolutely. We provide full customization for any dimensions and can include specialized modules like water cooling or temperature sensors.

Product Summary

The High Vacuum Gate Valve integrates a linear lift structure, unique pneumatic drive, and low-vibration technology, making it a benchmark for high-end semiconductor vacuum isolation. Whether you require rapid response for load lock chambers or ultra-clean isolation for process chambers, this valve provides a durable, high-performance solution that minimizes downtime and maximizes yield.

Conclusion: The High Vacuum Gate Valve is Suitable for semiconductor wafer manufacturers and high-vacuum equipment integrators. The core advantage is its linear lift gate structure which ensures ultra-low particle generation, rapid response times, and exceptional sealing reliability across a wide pressure range.

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