This high-performance high vacuum gate valve is a precision-engineered vacuum isolation and transmission device specifically designed for ultra-high vacuum (UHV), semiconductor wafer production, and load lock chamber isolation. Utilizing a linear lift-type gate opening and closing structure, it is perfectly suited for the full pressure range from 5×10⁻⁸ Pa to 1×10⁵ Pa (ultra-high vacuum to atmospheric pressure).
It enables rapid isolation and sealed partition of atmospheric-side load lock chambers in 200mm, 300mm, and 450mm semiconductor wafer production systems. With its fast switching speed, low particle generation, vibration-free operation, and ease of maintenance, this valve is the core preferred equipment for semiconductor vacuum systems and high-cleanliness vacuum transmission scenarios.
| Opening Diameter (DN) | Main Material | Actuator Type | Example Model Number |
|---|---|---|---|
| DN500 × 100 | Aluminum Alloy (Optional) | Pneumatic Double-Acting | VAvat-G1113-61-DN500X100 |
| DN800 × 130 | Stainless Steel (Optional) | Pneumatic Double-Acting | VAvat-G1113-62-DN800X130 |
| Note: All specifications are customizable; water-cooling and temperature control modules can be integrated upon request. | |||
The versatility of our high vacuum gate valve makes it indispensable in several high-tech industries:
Our gate valve is specifically engineered for scenarios requiring low particle generation and high response speeds. Compared to standard transmission valves, our design offers faster switching and significantly lower vibration, which is crucial for maintaining wafer integrity.
Fast Response & Long Life: Short opening/closing times with sensitive induction ensure a long service life under continuous production cycles. Low Maintenance: The unique cylinder design reduces wear and tear, making maintenance simple and cost-effective while ensuring high reliability in vacuum isolation tasks.
It is primarily used for isolating the atmospheric-side load lock chambers in 200mm to 450mm semiconductor wafer production systems.
The valve utilizes a pneumatic double-acting drive with a unique cylinder design for smooth and stable operation.
Yes, while aviation aluminum is standard, we offer stainless steel options to suit different corrosive conditions and cleanliness levels.
Absolutely. We provide full customization for any dimensions and can include specialized modules like water cooling or temperature sensors.
The High Vacuum Gate Valve integrates a linear lift structure, unique pneumatic drive, and low-vibration technology, making it a benchmark for high-end semiconductor vacuum isolation. Whether you require rapid response for load lock chambers or ultra-clean isolation for process chambers, this valve provides a durable, high-performance solution that minimizes downtime and maximizes yield.
Conclusion: The High Vacuum Gate Valve is Suitable for semiconductor wafer manufacturers and high-vacuum equipment integrators. The core advantage is its linear lift gate structure which ensures ultra-low particle generation, rapid response times, and exceptional sealing reliability across a wide pressure range.
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