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High Vacuum Butterfly Valve for Precision Flow Control and Semiconductor Applications
High Vacuum Butterfly Valve for Precision Flow Control and Semiconductor Applications
High Vacuum Butterfly Valve for Precision Flow Control and Semiconductor Applications
High Vacuum Butterfly Valve for Precision Flow Control and Semiconductor Applications

High Vacuum Butterfly Valve for Precision Flow Control and Semiconductor Applications

This high-performance high vacuum butterfly valve is engineered for ultra-high vacuum environments (5×10⁻⁸ Pa to 1×10⁵ Pa). It features a lightweight, compact design with rapid response and precise flow regulation capabilities. Ideal for semiconductor CVD/ALD processes, vacuum coating, and research applications, it supports multiple drive options (electric/pneumatic), various flange standards (ISO-KF, CF, etc.), and customizable sealing materials to ensure long-term reliability in demanding industrial vacuum systems.

This high-performance High Vacuum Butterfly Valve is a specialized vacuum pipeline control device designed for ultra-high vacuum environments, precise flow regulation, and rapid on-off operations. Featuring a lightweight butterfly plate structure, it is perfectly suited for the full pressure range from ultra-high vacuum to atmospheric pressure (5×10⁻⁸ Pa to 1×10⁵ Pa). It enables both rapid isolation of vacuum lines and high-precision flow adjustment.

With its fast response time, high control accuracy, low flow resistance, and compact design, this valve is widely utilized in semiconductor CVD/ALD processes, vacuum coating, vacuum furnaces, scientific research apparatus, and automated production lines. It stands as the core choice for flow control and pipeline isolation in high-end vacuum system configurations.

Core Features & Advantages

  • Flexible Drive Options: Supports electric control for precise flow regulation and pneumatic control for rapid switching. Pneumatic models can be equipped with solenoid valves to meet various automation needs.
  • Universal Flange Compatibility: Fully compatible with ISO-KF, ISO-F, CF-F, ASA-LP, and JIS standard flanges, ensuring seamless integration into any existing setup.
  • Customizable Sealing: Offers multiple sealing materials including Nitrile Rubber (NBR) and Fluororubber (Viton) to match specific corrosive environments and temperature requirements.
  • Premium Lightweight Materials: The main body is constructed from high-grade aviation aluminum alloy (optional materials available), providing high strength, low weight, and extremely low outgassing rates.
  • Wide Operating Range: Stable performance across the entire spectrum from ultra-high vacuum to positive pressure.
  • Long Service Life: Optimized valve plate and seal structures ensure smooth operation, resistance to dust accumulation, and anti-jamming capabilities for maintenance-free long-term use.

Product Specifications

Bore Size (DN) Main Material Actuator Type Example Model
DN25 ~ 50 Aluminum Alloy (Optional) Electric VAvat-E2113-11-DN25~50
DN60 ~ 250 Aluminum Alloy (Optional) Electric VAvat-E2113-31-DN60~250
DN25 ~ 50 Aluminum Alloy (Optional) Pneumatic (with Solenoid) VAvat-E1113-11-DN25~50
DN60 ~ 320 Aluminum Alloy (Optional) Pneumatic (with Solenoid) VAvat-E1113-31-DN60~320

Primary Application Fields

The versatility of our vacuum pump accessories allows them to excel in the most demanding industrial sectors:

  • Semiconductor CVD/ALD Processes: An ideal solution for fine vacuum control during wafer fabrication. The valve plate acts as a throttling element, adjusting conductance by changing the opening angle. Integrated with a pressure controller, it achieves target pressures rapidly.
  • Vacuum Flow Regulation: Serves as the central throttling component in vacuum lines to achieve vacuum pressure control and precise flow management.
  • Vacuum Coating Equipment: Essential for optical coating and integrated circuit coating processes where reliable switching and flow adjustment are critical.
  • Scientific Research: Used in surface analysis, material laboratories, and particle accelerators for precise pressure regulation and isolation.
  • Vacuum Furnaces: Ensures stable pressure and reliable pipeline control in high-vacuum sintering and heat treatment furnaces.

Why Choose the High Vacuum Butterfly Valve?

Compared to standard isolation valves, the butterfly design offers significantly lower flow resistance and a more compact footprint. It is specifically engineered for precise flow regulation + multi-mode switching + high reliability + fast response.

Whether you are dealing with harsh corrosive gases or extreme temperature fluctuations, this valve maintains stable operation. By allowing users to switch between "Vacuum Mode" and "Angle Mode," it provides unparalleled flexibility for complex process control. When connected to external vacuum sensors, it enables high-precision closed-loop pressure control, making it the benchmark for modern vacuum technology.

Frequently Asked Questions (FAQ)

1. What is the primary use of this valve?

It is used for rapid on-off switching and precise flow regulation in vacuum pipelines, especially in semiconductor processes like CVD and ALD.

2. What drive methods are available?

We offer electric control (for flow regulation) and pneumatic control (for rapid switching). Pneumatic versions can include solenoid valves for automation.

3. Can I customize the flange or material?

Yes, we support all major standards (ISO, CF, ASA, JIS) and can provide alternative materials based on your specific chemical compatibility needs.

4. Is it suitable for harsh environments?

Absolutely. The valve is designed with high corrosion resistance and optimized seals to ensure reliable operation in demanding industrial conditions.

Conclusion: The High Vacuum Butterfly Valve is Suitable for semiconductor manufacturing, research laboratories, and industrial vacuum coating systems. The core advantage is its ability to provide high-precision flow regulation and rapid response across a wide vacuum range (5×10⁻⁸ Pa to 1×10⁵ Pa) with multi-drive flexibility.

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