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7KV Starcell Ion Pump 2L-200B - High Vacuum Pump for SEM, Particle Accelerators & Ultra-High Vacuum Systems (UHV)
7KV Starcell Ion Pump 2L-200B - High Vacuum Pump for SEM, Particle Accelerators & Ultra-High Vacuum Systems (UHV)
7KV Starcell Ion Pump 2L-200B - High Vacuum Pump for SEM, Particle Accelerators & Ultra-High Vacuum Systems (UHV)

7KV Starcell Ion Pump 2L-200B - High Vacuum Pump for SEM, Particle Accelerators & Ultra-High Vacuum Systems (UHV)

Discover the 7KV Starcell Ion Pump 2L-200B - the premium ultra-high vacuum solution for SEM, particle accelerators, and research labs. Achieve 10⁻¹¹ mbar clean vacuum with zero vibration or contamination.  

This comprehensive guide covers the 7KV Starcell Ion Pump 2L-200B's technical specifications, semiconductor and research applications, installation tips, and answers to 10 critical FAQs about ultra-high vacuum performance and maintenance.

Product Introduction: 7KV Starcell Ion Pump 2L-200B

The 7KV Starcell Ion Pump 2L-200B represents the pinnacle of ultra-high vacuum (UHV) technology, delivering unmatched performance for the most demanding scientific and industrial applications.

Key Advantages

 

✔ Ultra-high vacuum - Achieves 10⁻¹¹ mbar baseline pressure
✔ Zero contamination - No hydrocarbons or backstreaming
✔ Vibration-free operation - Ideal for sensitive instruments
✔ Long service life - 50,000+ hours typical operation
✔ Compact design - Fits restricted laboratory spaces

Specifications:

Model

2L-200B

Flange

DN150CF

Pumping speed(L/S)

( air)

230

Pumping speed

(Ar)

2.4

Start-up pressure (Pa)

≤5×10-4

ultimate pressure (Pa)

2.7×10-8

(℃)baking temperature

 

<200

 

With magnetic

 

 

Without magnetic

<300

working voltage(KV)

7

electrode unit

4

dimension(mm)

200×140(4-M12)

L*W*H (mm)

500×265×430

(kg) weight

100

 

 

Industry Application Cases

Case 1: Scanning Electron Microscopy (SEM)

A materials research lab achieved:

 

Stable 5×10⁻¹⁰ mbar working pressure

Zero image distortion from pump vibrations

3+ years of maintenance-free operation

Case 2: Particle Accelerator Facility

Performance highlights:

 

Handled beamline pressures <10⁻⁹ mbar

Operated continuously for 18 months

Zero pump-induced beam instability

Case 3: Thin Film Deposition System

Key benefits:

Eliminated hydrocarbon contamination

Enabled 10⁻¹⁰ mbar base pressure

Reduced system downtime by 80%

 


 

7KV Starcell Ion Pump 2L-200B FAQs

1. How does an ion pump work?

Uses a Penning discharge to ionize gas molecules, which are then implanted into titanium cathodes.

2. What gases can it pump effectively?

Best for noble gases and nitrogen. Less effective for light gases (H₂, He).

3. Does it require regular maintenance?

No - completely maintenance-free except for eventual cathode replacement.

4. What's the typical lifespan?

50,000+ hours (≈5.7 years continuous operation) before cathode replacement.

5. Is baking required?

Yes, should be baked to 250-300°C for UHV applications.

6. How does it compare to turbomolecular pumps?

Advantages:

 

No moving parts

No vibration

No oil contamination

Lower power consumption

7. Can it handle sudden gas bursts?

Limited capacity - best used with a foreline pump for initial pumpdown.

8. What power supply is required?

7kV DC, typically 5W power consumption during normal operation.

9. Is it suitable for space simulation?

Yes, widely used in space environment simulation chambers.

10. How to monitor pump performance?

Current draw indicates pressure - 1μA ≈ 10⁻⁹ mbar for nitrogen.

 


 

Conclusion

The 7KV Starcell Ion Pump 2L-200B delivers unparalleled ultra-high vacuum performance for critical scientific and industrial applications. Its clean, vibration-free operation makes it the ideal choice for SEM, particle accelerators, and advanced research systems.

When absolute vacuum purity and stability are required, ion pump technology remains the gold standard. Our technical team can help you integrate the 2L-200B into your UHV system for optimal performance. Contact us today for application-specific recommendations and support.

 


 

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