2L-200C Industrial Sputter Ion Pump | Oil-Free UHV System | For Chip Manufacturing/Space Simulation

2L-200C Sputter Ion Pump 7KV | 20L/s Pumping Speed | CF Flange | For Research & Semiconductor

This guide explores the 2L-200C sputter ion pump's technical specifications, semiconductor and aerospace applications, installation best practices, and answers to 10 critical FAQs about ultra-high vacuum performance in clean manufacturing environments.

Ion Pump , 2L-200C , DN150CF , 220L/s Air , 2.4L/s Ar , +7KV

Sputter-ion pump is vacuum generation equipment for obtaining clean and ultra-high vacuum.The sputter-ion pump is main pump of oil less ultra-high vacuum set. The ion pump works in a closed system which doesn't require continuous working backing pump.

Advantages:

1. Cleanness

2. High vacuum degree

3. Zero noise

4. Zero vibration

5. Convenient to operate

Applications:

1. High-energy particle accelerator

2. Controlled thermonuclear reaction apparatus

3. Electric vacuum device

4. Semiconductor material

5. Electronic microscope

6. Mass spectrometer

Product Introduction: 2L-200C Sputter Ion Pump

The 2L-200C represents the industrial-grade evolution of sputter ion pump technology, specifically engineered for mission-critical applications in semiconductor fabrication and space environment testing.

Key Advantages

✔ Ultra-clean operation - Zero hydrocarbon contamination risk
✔ Maintenance-free - No consumables for 50,000+ hours
✔ Vibration-free - Eliminates substrate patterning defects
✔ UHV compatible - Achieves 10⁻¹¹ mbar base pressure
✔ Robust construction - Withstands repeated bakeout cycles

Industry Application Cases

Case 1: 5nm Chip Fabrication

A leading foundry achieved:

Stable 10⁻⁹ mbar process pressure

Zero pump-induced wafer contamination

99.98% uptime over 3-year period

Case 2: Satellite Component Testing

Performance highlights:

Simulated 10⁻¹⁰ mbar orbital conditions

Continuous 8,000-hour operation

Met NASA outgassing requirements

Case 3: Quantum Computing Research

Key benefits:

Maintained 10⁻¹¹ mbar in cryogenic environment

Eliminated magnetic interference

Enabled 72-hour coherence times

2L-200C Sputter Ion Pump FAQs

1. How does it differ from standard ion pumps?

Features enhanced pumping for hydrogen and methane - critical for semiconductor processes.

2. What's the startup procedure?

Requires roughing to <10⁻⁴ mbar before activation - typically with turbomolecular pump.

3. Can it handle process gases?

Limited capacity for reactive gases - consult manufacturer for specific gas loads.

4. What maintenance is required?

None during normal operation - cathode replacement after ≈50,000 hours.

5. Is baking necessary?

Essential for UHV - rated for daily bakeouts to 350°C.

6. How to monitor pump health?

Current vs pressure characteristics provide diagnostic data.

7. What's the power consumption?

Typically 3-15W depending on pressure and gas load.

8. Can multiple pumps be combined?

Yes, common practice for large chambers - parallel operation supported.

9. Is it compatible with automation?

Standard RS-485 interface for system integration.

10. Lead time for replacement?

Standard units ship in 2-3 weeks - expedited options available.

Conclusion

The 2L-200C industrial sputter ion pump sets the benchmark for reliable ultra-high vacuum in advanced manufacturing and research. Its contamination-free operation and exceptional stability make it indispensable for cutting-edge semiconductor production and rigorous space simulation applications.

For engineers designing next-generation vacuum systems, the 2L-200C delivers unparalleled performance where even molecular-level contamination cannot be tolerated. Contact our UHV specialists today for application engineering support and system integration guidance.