Cryogenic Vacuum Pump

ECM Series Cryopump for Semiconductor Manufacturing and Ion Implantation

ECM Series Cryopump for Semiconductor Manufacturing and Ion Implantation

The ECM Series Cryopump is a cutting-edge vacuum solution engineered for semiconductor IC manufacturing and ion implantation. Featuring fully automatic regeneration, PLC-based remote monitoring, and adaptive thermal compensation, this high-purity, stainless steel pump ensures stable, reliable, and safe operation for advanced 7nm process nodes and beyond.

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Product Details

The ECM Series Semiconductor-Specific Cryogenic Pump is a high-performance, fully intelligent vacuum solution developed by Taixing specifically for semiconductor integrated circuits and ion implantation systems. This cryogenic vacuum pump features rapid automatic regeneration and remote monitoring capabilities, making it the core choice for high-cleanliness and high-reliability semiconductor vacuum processes.

Core Features

Internal Heating & Auto-Regeneration Built-in heating system supports one-touch automatic regeneration, eliminating manual intervention and significantly improving equipment utilization and production line efficiency.

External Nitrogen Purge Device Equipped with an external nitrogen gas inlet for safe purging during regeneration and maintenance, preventing impurity contamination and oxidation risks.

Exhaust Safety Valve Integrated safety valve compatible with exhaust gas treatment systems, meeting semiconductor industry environmental and safety standards for compliant emissions.

Intelligent Adaptive Thermal Compensation Features an "Adaptive" function that dynamically compensates for low-temperature heat loads based on operating conditions, ensuring stable and reliable pumping performance.

PLC Remote Operation Supports remote start/stop, parameter adjustment, and status monitoring via industrial PLC, perfectly suited for automated production line integration.

Full Parameter Automatic Control Allows preset and automatic control of key process parameters such as temperature, regeneration, roughing, and heating for precise process management.

Technical Specifications

Parameter	Specification Details
Pumping Speed (Air)	1,500 - 10,000 L/s (Model Dependent)
Ultimate Pressure	< 10^-8 Pa
Regeneration Time	< 150 Minutes (Rapid Mode)
Control Interface	RS485 / PLC / Ethernet
Installation Orientation	Vertical / Elbow / Universal
Body Material	High-Grade Stainless Steel (304/316L)
Cooling Capacity	Adaptive Compensation up to 100W @ 80K

Application Fields

The ECM Series cryogenic vacuum pump is designed for the most demanding environments:

Semiconductor IC Manufacturing: Essential ultra-high vacuum support for ion implantation, thin-film deposition (PVD/CVD), and etching processes.
Ion Implanter Support: Provides a stable, ultra-clean vacuum environment for ion beam transport and target chambers.
Advanced Process R&D: Meets the vacuum requirements for 7nm and below advanced nodes, ensuring device yield and performance.
Semiconductor Equipment OEM: Integrated as a core vacuum component in high-end semiconductor manufacturing tools to enhance overall system performance.

Why Choose the ECM Series?

The ECM series is an intelligent vacuum device tailored for the rigorous demands of semiconductor fabrication. Its core advantage lies in the integration of internal heating and automatic regeneration, enabling unmanned stable operation. With external nitrogen purging and exhaust safety valves, it ensures process safety and environmental compliance. The intelligent "Adaptive" thermal compensation precisely maintains low-temperature performance even under fluctuating loads. By choosing this cryogenic vacuum pump, users benefit from seamless PLC integration and full parameter control, making it a reliable partner for advanced node vacuum systems.

Frequently Asked Questions

1. What is the primary advantage of the automatic regeneration function?

It completes the entire cycle of heating, purging, roughing, and cooling without manual intervention, drastically reducing downtime and increasing Overall Equipment Effectiveness (OEE).

2. How does the "Adaptive" thermal compensation work?

It dynamically adjusts to heat load changes during the process, preventing vacuum fluctuations caused by process load variations and ensuring consistent pumping speed.

3. Can it be integrated into a smart factory?

Yes, the ECM series cryogenic vacuum pump supports full PLC remote operation, allowing for real-time monitoring and automated parameter adjustments within a smart manufacturing framework.

Conclusion: The ECM Series Semiconductor Cryogenic Pump is Suitable for semiconductor manufacturers and ion implantation equipment OEMs. The core advantage is its fully intelligent automatic regeneration and adaptive thermal compensation.

Data Source: Taixing Pump Official Technical Data, Updated on October 27, 2023.

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