Cryogenic Vacuum Pump

CRYO-P Series High Vacuum Cryogenic Pumps for Semiconductor and Coating

CRYO-P Series High Vacuum Cryogenic Pumps for Semiconductor and Coating

The CRYO-P series cryogenic pump is a high-performance, oil-free vacuum solution utilizing cryocondensation and adsorption technology. Capable of reaching an ultimate vacuum of 10⁻⁷ Pa (up to 10⁻⁹ Pa with bake-out), it is designed for demanding applications including semiconductor fabrication, thin-film coating, and space simulation. Featuring flexible installation, low operating costs, and customizable corrosion-resistant or bake-out models, the CRYO-P series provides reliable, high-purity vacuum performance for advanced industrial and scientific research.

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Product Details

The CRYO-P series cryogenic vacuum pump is a high-performance cluster-type vacuum equipment utilizing the principles of cryogenic condensation and adsorption. As a premier solution for obtaining an oil-free high vacuum environment, it achieves an ultimate vacuum of up to 10⁻⁷ Pa. This series is widely utilized in semiconductor manufacturing, vacuum coating, space simulation, and other high-end vacuum fields, serving as the core equipment for high-cleanliness and ultra-high vacuum scenarios.

Core Features

Oil-Free & Pollution-Free: By employing cryogenic condensation and adsorption, it eliminates oil contamination, ensuring an ultra-clean vacuum environment.
Extreme Ultimate Vacuum: Capable of reaching pressures below 10⁻⁷ Pa, meeting the stringent requirements of high-end scientific research and industrial production.
Low Operating Costs: No liquid helium is required; it operates using standard cooling media, significantly reducing operational and maintenance expenses.
Flexible Installation: Simple operation with the ability to be installed in any orientation to fit various vacuum system layouts.
Safe and Reliable: Features a fully sealed design with zero leakage risk, ensuring a long service life and user safety.
Customizable Adaptability: Supports "Bakeable" versions (high-temperature baking of the outer shell to reach 10⁻⁹ Pa) and "Corrosion-Resistant" versions (special internal coatings for harsh environments).
Wide Pumping Speed Range: Nitrogen pumping speeds range from 1,700 to 28,000 L/s, while Hydrogen speeds reach up to 43,000 L/s.
High Cooling Efficiency: Cooldown time ranges from 90 to 240 minutes (at 50Hz), quickly reaching operating temperatures to improve system throughput.

Technical Specifications

Model	CRYO-P8	CRYO-P10	CRYO-P12	CRYO-P16	CRYO-P20	CRYO-P22	CRYO-P28	CRYO-P30
Pumping Speed (N₂) L/s	1,700	2,400	4,000	5,000	10,000	17,000	21,000	28,000
Pumping Speed (H₂) L/s	2,700	3,700	6,000	11,000	18,000	25,000	39,000	43,000
Pumping Speed (Ar) L/s	1,400	2,000	3,300	4,200	8,400	14,000	19,000	23,000
Pumping Speed (H₂O) L/s	4,000	6,900	9,500	16,000	29,000	39,000	57,000	70,000
Ultimate Pressure (Pa)	10⁻⁷	10⁻⁷	10⁻⁷	10⁻⁷	10⁻⁷	10⁻⁷	10⁻⁷	10⁻⁷
Cooldown Time (min)	100	112	100	120	160	165	180	240

Application Fields

The high-performance cryogenic vacuum pump is essential for:

Evaporation Coating: Ensures high-cleanliness for superior film quality and uniformity.
Semiconductor Manufacturing: Ideal for wafer fabrication and lithography processes.
Space Simulation: Replicates the vacuum of outer space for aerospace component testing.
Ion Implantation: Provides a stable vacuum to ensure precision in ion beam delivery.
Molecular Beam Epitaxy (MBE): Supports the growth of ultra-thin films with high structural integrity.
Surface Analysis: Creates interference-free environments for XPS and AES analysis.
High Energy Physics: Used in particle accelerators and large-scale research devices.

Why Choose the CRYO-P Series?

Choosing the right ultra-high vacuum environment solution is critical for precision industries. The CRYO-P series stands out due to its oil-free design, which prevents hydrocarbon contamination. With pumping speeds covering a vast range and customizable flange sizes (VG/ISO 200 to 750), it integrates seamlessly into any system. Whether you require the standard model or a specialized bakeable version for 10⁻⁹ Pa levels, this series provides the reliability and efficiency needed for the most demanding applications.

Frequently Asked Questions

1. What is the primary advantage of the CRYO-P series?

It provides an oil-free, ultra-clean vacuum environment up to 10⁻⁷ Pa, which is vital for contamination-sensitive processes like semiconductor manufacturing.

2. Can the pump be customized for corrosive gases?

Yes, we offer a corrosion-resistant version featuring special internal coatings to protect the pump components from aggressive media.

3. How long does it take to reach the working temperature?

Depending on the model size, the cooldown time ranges from 90 to 240 minutes at 50Hz.

4. Does it require liquid helium?

No, the advanced cryogenic pump design uses standard cooling cycles, eliminating the need for expensive liquid helium and reducing maintenance costs.

Conclusion: The CRYO-P Series Cryogenic Vacuum Pump is suitable for semiconductor manufacturers, research laboratories, and high-end industrial coating facilities. The core advantage is its ability to provide an oil-free ultra-high vacuum (10⁻⁷Pa) with high pumping speeds and customizable configurations.

Data Source: https://www.taixingpump.com/cryogenic-vacuum-pump, Updated on October 2023.

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