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Oil Vacuum pump
Radio-Frequency Vacuum Cleaning System
Radio-Frequency Vacuum Cleaning System
Radio-Frequency Vacuum Cleaning System
Radio-Frequency Vacuum Cleaning System

Radio-Frequency Vacuum Cleaning System

This equipment adopts plasma cleaning technology, which uses high-energy plasma to bombard the surface of the device to be cleaned, and causes the contaminants to fall off from the inner surface of the pores through physical action to achieve the cleaning effect. It has the characteristics of high vacuum degree, high cleaning efficiency, convenient operation, stability and reliability, etc. It is mainly used for precision Clean the complex closed channels inside the device.
Parameter Specification
UItimate vacuum 1×10-Pa
RF frequency 13.56 MHz
RF powei 0-500   W
Process gases Oxygen,Neon,Argon
Process gas pressure range 100-10000 Pa
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