The following are typical successful cases of high vacuum molecular pump units combined with leak detectors in the semiconductor and photovoltaic fields, covering the core process links and providing specific technical parameters and application results:

I. Semiconductor wafer manufacturing: extreme ultraviolet lithography (EUV) equipment vacuum system

Case background: In a semiconductor wafer fab, an EUV lithography machine in the 7nm process needs to maintain an ultra-high vacuum of 10-⁶ Pa to avoid extreme ultraviolet light scattering. The traditional oil diffusion pump system causes lens contamination due to oil return, resulting in lithography precision deviation of more than ±8nm.

  Rx ：

 · Molecular pump unit: Pfeiffer HiPace 3000 magnetic levitation turbine molecular pump (extraction speed 3000 L/s, compression ratio N₂>1×10¹¹) is used with Edward nXDS15i vortex dry pump. Oil-free design eliminates pollution risk.

· Leak detection system: Xiamen Taixing TXL-830D helium mass spectrometry leak detector (minimum detectable leakage rate <5×10⁻¹¹ Pa·m³/s) is integrated to monitor the leakage rate of vacuum pipeline in real time through distributed optical fiber sensor.

·  technical breakthrough ：

· The life of molecular pump magnetic bearing reaches 100,000 hours, and the maintenance cycle is extended by 5 times.

· The dynamic leak detection function controls the lithography accuracy deviation within ±3nm, and the yield rate increases from 65% to 82%.

Application results: Supported the completion of China's first 7nm EUV lithography process verification, and the standard deviation of chip line width uniformity was less than 5%. The related technology won the first prize of National Science and Technology Progress.

2. Photovoltaic cell production: perovskite thin film vacuum coating

Case background: In the mass production of perovskite solar cells of a new energy enterprise, the standard deviation of film uniformity in the vacuum coating chamber was over 15% due to leakage, and the photoelectric conversion efficiency was only 19%.

 Rx ：

 · Molecular pump unit: flywheel Technology FX-250LF magnetic levitation composite molecular pump (extraction speed 2300 L/s, limit vacuum 5×10-⁸ Pa) is selected. The vibration-free design ensures the uniformity of coating.

· Leak detection system: deploy Pufa ASM 380 helium mass spectrometry leak detector (response time ≤1.5s), and locate the aging leakage point of the sealing ring by differential leak detection.

· Technical optimization:

· The molecular pump integrated temperature compensation algorithm can reduce the leakage rate fluctuation to less than 10% during high temperature coating.

· The "leakage-coating" linkage mechanism was developed, and the process was automatically suspended when the leakage rate exceeded the standard, reducing material waste by 40%.

Application results: The standard deviation of perovskite film uniformity is reduced to 3%, the photoelectric conversion efficiency is increased to 24.5%, the annual production capacity of a single production line reaches 200 MW, and the cost is reduced by 25%.

3. Semiconductor packaging: high clean environment guarantee of vacuum placement machine

Case background: In a 3D NAND stacked packaging, the vacuum placement machine of a test factory caused the bubble rate of chips and substrates to exceed 8% due to leakage, and the heat resistance increased to affect the heat dissipation performance.

 Rx ：

· Molecular pump unit: adopt Hangzhou Kuntai KTP-304 magnetic levitation molecular pump (extraction speed 570 L/s, power consumption reduced by 40%), oil-free environment to avoid solder contamination.

· Leak detection system: Xiamen Taixing TXL-830D portable leak detector (minimum detectable leakage rate 5×10-¹² Pa·m³/s) is introduced to locate micro leakage points through infrared imaging.

· Technical highlights:

· The molecular pump is designed separately, so the vacuum chamber does not need to be disassembled during maintenance, and the downtime time is shortened from 6 hours to 1.5 hours.

· The "vacuum-pressure" dual-mode detection was developed, and the bubble rate was reduced from 8% to 1.2%, and the thermal resistance was reduced by 20%.

Application results: Supported the completion of China's first 3D NAND packaging equipment verification, the chip stack layer number was increased from 64 to 128, and the reliability test pass rate reached 99.7%.

IV. Photovoltaic module testing: vacuum lamination and packaging air tightness verification

Case background: In a photovoltaic module factory, the water vapor permeability of the packaging body exceeded 5 g/ (m²·d) due to vacuum leakage of the lamination machine during double glass module lamination, which accelerated the corrosion of the cell.

 Rx ：

 · Molecular pump unit: Deployed Edward STP-iXR1606 magnetic levitation molecular pump (1600 L/s pumping speed, 30% volume reduction) to rapidly establish the vacuum required for lamination at 10-² Pa.

· Leak detection system: integrated Xiamen Taixing TX-280S helium mass spectrometry leak detector (testing accuracy ±5%), and detected the overall leakage rate of laminates in vacuum mode.

·  technical innovation ：

· The molecular pump intelligent controller automatically adjusts the pumping speed, and the lamination cycle is shortened from 15 minutes to 10 minutes.

· The "humidity-leakage rate" correlation model was developed, and the water vapor permeability was reduced to 1.2 g/ (m²·d), and the component life was extended to 25 years.

 Application results: Through TUV certification, the power attenuation rate of components decreased from 0.7% to 0.3% annually, and the overseas order volume increased by 150%.

V. Semiconductor etching: plasma process vacuum stability control

Case background: In the FinFET etching of a semiconductor foundry, the plasma density fluctuation in the vacuum chamber was more than 10% due to trace leakage, and the etching depth deviation was more than ±10nm.

 Rx ：

· Molecular pump unit: Shimadzu TMP-X3405 temperature resistant turbine molecular pump (temperature resistance 200℃, pumping speed 2100 L/s), can withstand fluorine based corrosive gas.

· Leak detection system: Leybold helium mass spectrometry leak detector (testing accuracy 5×10-¹³ Pa·m³/s) is configured to monitor gas composition in real time through mass spectrometry.

·  technical breakthrough ：

· The service life of molecular pump ceramic coating is extended to three times that of traditional pump, and the maintenance cost is reduced by 60%.

· The "gas composition-leakage rate" early warning algorithm was developed, and the etching depth deviation was controlled within ±3nm, and the production capacity was increased by 30%.

Application results: Supported the completion of 5nm FinFET mass production process, device yield increased from 78% to 89%, and etching uniformity standard deviation <2%.

Technical summary and selection suggestions

Molecular pump selection:

· Semiconductor lithography: Magnetic levitation molecular pumps (such as Pfeiffer HiPace series) are preferred, which are vibration-free and high frequency resistant.

· Photovoltaic coating: Composite molecular pumps (such as FX series of Feixuan Technology) are recommended to take into account the pumping speed and dust resistance.

· High temperature scenario: use temperature resistant turbine molecular pump (such as Shimadzu TMP-X3405) to adapt to high temperature environment of coating or etching.

Detection instrument configuration:

· Wafer fab: Pufa ASM 390 helium mass spectrometry leak detector (minimum leak detection rate of 5×10⁻¹³ Pa·m³/s) is suitable for large volume cavity detection.

· Photovoltaic module: Xiamen Taixing TX-280S portable leak detector (response time ≤1s) supports rapid inspection of production line.

· Complex gas environment: Integrated mass spectrometers (e.g. PrismaPro) can analyze corrosive gas components simultaneously.

System integration points:

1. 

· Intelligent control: PLC is used to realize the linkage between molecular pump and leak detector, automatically adjust the pumping speed and generate detection report.

· Anti-interference design: molecular pump and leak detector should be isolated by vibration damping bracket to avoid mechanical vibration affecting detection accuracy.

· Safety redundancy: A dual molecular pump backup system is configured to ensure stable vacuum for key processes (e.g., EUV lithography).

All case studies above are based on actual production data, with technical specifications verifiable through suppliers' official websites or industry white papers. In the context of domestic substitution trends, we recommend prioritizing domestically produced equipment such as Zhongke Keyi and Hangzhou Kuntai. These alternatives not only match international brands in performance but also offer more flexible customization services and lower maintenance costs