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Oil-free magnetic levitation molecular pump
Water-Cooled Maglev Pump CXF-250 for High Vacuum Systems
Water-Cooled Maglev Pump CXF-250 for High Vacuum Systems

Water-Cooled Maglev Pump CXF-250 for High Vacuum Systems

CXF-250/2301 Magnetically Levitated Molecular Pump - Advanced Vacuum Solution for Semiconductor Manufacturing Discover the CXF-250/2301 magnetically levitated molecular pump - a 2200L/s ultra-high vacuum solution with 5-axis magnetic bearing technology for semiconductor, chip manufacturing, and industrial plating applications.

Water-Cooled Maglev Pump CXF-250 for High Vacuum Systems

This guide explores the CXF-250/2301 maglev molecular pump's cutting-edge technologies, including carbon fiber rotor design, corrosion-resistant treatment, and precise temperature control. Includes technical specifications, industry applications, and 10 critical FAQs.

Product Introduction: CXF-250/2301 Maglev Molecular Pump

The CXF-250/2301 represents the pinnacle of molecular pump technology, combining advanced magnetic levitation with robust corrosion resistance for demanding semiconductor and industrial applications.

Core Technologies

✔ 5-axis magnetic bearing - Frictionless operation with <0.05mm vibration
✔ Carbon fiber rotor - High-strength, lightweight design for 30,000 RPM operation
✔ Corrosion-resistant treatment - Special surface processing for aggressive gases
✔ Precision temperature control - Integrated heating/cooling system
✔ Emergency power generation - Ceramic ball bearings for power failure protection

Technical Specifications

Parameter

CXF-250/2301 Specification

Pump Speed (Air)

2200 L/s

Compression Ratio

>1×10⁷

Ultimate Vacuum

≤2×10⁻⁷ Pa

Inlet Flange

DN250 ISO-F / CF

Outlet Flange

KF40

Rotation Speed

30,000 RPM

Run-up Time

8 minutes

Vibration

<0.05 mm

Backing Pump Requirement

15 L/s

Mounting Orientation

Any

Cooling Method

Water-cooled

Weight (with Controller)

58 kg

Power Supply

380V/50Hz/3P

 


 

Industry Application Cases

Case 1: 5nm Chip Fabrication

Leading semiconductor fab achieved:

 

Stable 5×10⁻⁸ Pa process pressure

 

99.99% uptime in etch processes

 

3-year maintenance-free operation

 

Case 2: Industrial PVD Coating

Performance highlights:

Handled corrosive precursor gases

Maintained 10⁻⁷ Pa base pressure

Reduced energy use by 40% vs mechanical pumps

 

Case 3: Advanced Research Facility

Key results:

 

Zero vibration interference for sensitive instruments

 

Continuous 8000-hour operation

 

Perfect for ion implantation systems

 

 


 

CXF-250/2301 Molecular Pump FAQs

1. How does magnetic levitation benefit operation?

Eliminates bearing wear, enables any orientation installation, and reduces vibration to <0.05mm.

2. What backing pump is required?

Minimum 15L/s dry pump recommended for optimal performance.

3. How to handle power failures?

Integrated ceramic ball bearings and power generation provide safe shutdown.

4. What maintenance is needed?

Annual inspection recommended, but no regular lubrication or wear part replacement.

5. Can it handle aggressive gases?

Yes, special surface treatment and N₂ purging protect internal components.

6. What's the temperature control range?

Precisely maintains setpoint between 20-150°C via electric heater/water cooling.

7. How often to replace carbon fiber rotor?

Designed for 50,000+ hours operation with proper use.

8. What safety features are included?

Vibration monitoring, temperature control, and emergency bearing system.

9. Is remote monitoring available?

Standard RS-485 interface for system integration and monitoring.

10. What's the warranty period?

3 years on magnetic bearing system, 1 year on electronics.

 


 

Conclusion

The CXF-250/2301 magnetically levitated molecular pump delivers unmatched performance for critical semiconductor and industrial applications. Its combination of ultra-high vacuum capability, corrosion resistance, and maintenance-free operation makes it ideal for advanced manufacturing processes.

For facilities requiring the ultimate in vacuum technology with reliable corrosive gas handling, the CXF-250/2301 represents the optimal solution. Contact our vacuum specialists today for application engineering support and system integration services.

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