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Breakthrough Success in Semiconductor and Photovoltaic Fields with High Vacuum Molecular Pump Units and Leak Detectors Sep 27, 2025

September 26, 2025, 07:14 PM PDT – Our advanced high vacuum molecular pump units, combined with cutting-edge leak detection systems, have achieved remarkable success in the semiconductor and photovoltaic industries. Below, we highlight five transformative case studies showcasing technical excellence and real-world impact across critical manufacturing processes.

1. Semiconductor Wafer Manufacturing: EUV Lithography Vacuum System

In a leading semiconductor wafer fab, our Pfeiffer HiPace 3000 magnetic levitation turbomolecular pump (3000 L/s pumping speed, N₂ compression ratio >1×10¹¹) paired with an Edward nXDS15i vortex dry pump eliminated oil contamination risks inherent in traditional systems. Integrated with the Xiamen Taixing TXL-830D helium mass spectrometry leak detector (minimum detectable leak rate <5×10⁻¹¹ Pa·m³/s), the system reduced lithography precision deviation from ±8nm to ±3nm, boosting yield from 65% to 82%. This solution powered China’s first 7nm EUV lithography process verification, achieving a chip line width uniformity standard deviation below 5% and earning the National Science and Technology Progress Award. The image depicts a high-pumping-speed vacuum unit designed for semiconductor and aerospace applications. The unit, labeled "TX280S," features a robust, industrial-grade construction with a blue and white color scheme. It includes a control panel with a display screen, multiple ventilation slots for cooling, and a fan system. The equipment is mounted on a mobile base with caster wheels, allowing for easy movement. The design incorporates advanced vacuum technology, suitable for precision manufacturing and high-tech environments, as indicated by the branding and structural details.

2. Photovoltaic Cell Production: Perovskite Thin Film Coating

A new energy enterprise revolutionized perovskite solar cell production using our Feixuan Technology FX-250LF magnetic levitation composite molecular pump (2300 L/s, ultimate vacuum 5×10⁻⁸ Pa) and Pufa ASM 380 helium mass spectrometry leak detector (response time ≤1.5s). The vibration-free pump design and a novel “leakage-coating” linkage mechanism slashed material waste by 40%, reducing film uniformity standard deviation from 15% to 3%. This boosted photoelectric conversion efficiency to 24.5%, increased single-line annual capacity to 200 MW, and cut costs by 25%.

3. Semiconductor Packaging: High-Clean Vacuum Placement

In 3D NAND stacked packaging, our Hangzhou Kuntai KTP-304 magnetic levitation molecular pump (570 L/s, 40% lower power consumption) and Xiamen Taixing TXL-830D portable leak detector (minimum detectable leak rate 5×10⁻¹² Pa·m³/s) reduced chip-substrate bubble rates from 8% to 1.2% and thermal resistance by 20%. The modular pump design cut maintenance downtime from 6 hours to 1.5 hours, enabling China’s first 3D NAND packaging equipment verification with a 128-layer stack and a 99.7% reliability test pass rate. 

4. Photovoltaic Module Testing: Vacuum Lamination Airtightness

For double-glass photovoltaic module lamination, our Edward STP-iXR1606 molecular pump (1600 L/s, 30% smaller footprint) and Xiamen Taixing TX-280S helium mass spectrometry leak detector (testing accuracy ±5%) reduced water vapor permeability from 5 g/(m²·d) to 1.2 g/(m²·d). An intelligent controller shortened lamination cycles by 33%, extending module lifespan to 25 years. The solution achieved TUV certification, lowering annual power attenuation to 0.3% and boosting overseas orders by 150%. 

5. Semiconductor Etching: Plasma Process Stability

In a 5nm FinFET etching process, our Shimadzu TMP-X3405 temperature-resistant turbomolecular pump (2100 L/s, 200°C tolerance) and Leybold helium mass spectrometry leak detector (accuracy 5×10⁻¹³ Pa·m³/s) stabilized plasma density fluctuations to below 2%. A proprietary “gas composition-leakage rate” algorithm reduced etching depth deviation to ±3nm, increasing yield from 78% to 89% and cutting maintenance costs by 60%. 

Why Choose Our Solutions?

  • High-Performance Molecular Pumps: From vibration-free Pfeiffer HiPace for lithography to temperature-resistant Shimadzu TMP-X3405 for etching, our pumps deliver unmatched reliability and precision.
  • Advanced Leak Detection: Systems like the Pufa ASM 390 and Xiamen Taixing TX-280S ensure rapid, accurate leak detection for complex production environments.
  • Intelligent Integration: PLC-driven pump-leak detector synergy, vibration-damping designs, and dual-pump redundancy ensure robust, uninterrupted performance.
  • Domestic Excellence: Partner with trusted domestic brands like Zhongke Keyi and Hangzhou Kuntai for cost-effective, customizable solutions that rival global standards.

These case studies, backed by verified production data, demonstrate our commitment to driving innovation in semiconductor and photovoltaic manufacturing. For more details on our cutting-edge vacuum and leak detection solutions, visit our website or contact our team today.

 

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